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Company Profile
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Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
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Consumables for sale
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Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
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Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Contact
Plasma ion source evaporation system
Category :
Vacuum evaporation system
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Feature of product:
The machine is suitable for academic, research and industrial use.
The substrate size is 2~8 inch wafer.
Fast coating speed and good adhesion and compactness.
Simple structure and convenient maintenance.
Use heating wire method for heating, and different modules for temperature control
Process and industry:
LED ITO transparent conductive film manufacturing process.
OLED transparent conductive film manufacturing process / oxide multilayer film manufacturing process.
Research machines for academic and research circles
Product Gallery:
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Related:
Electron beam + thermal evaporation system
Double electron beam evaporation system
Laser (laser) optical evaporation system
Electron beam evaporation system
