Plasma ion source evaporation system

  • The machine is suitable for academic, research and industrial use.
  • The substrate size is 2~8 inch wafer.
  • Fast coating speed and good adhesion and compactness.
  • Simple structure and convenient maintenance.
  • Use heating wire method for heating, and different modules for temperature control
  • LED ITO transparent conductive film manufacturing process.
  • OLED transparent conductive film manufacturing process / oxide multilayer film manufacturing process.
  • Research machines for academic and research circles