Electron beam + thermal evaporation system
- Category : Vacuum evaporation system, Vacuum system
- Feature of product:
- The machine is suitable for academic, research and industrial use.
- The substrate size is 2~8 inch wafer.
- Electron beam and thermal resistance evaporation source coating can be switched according to the process.
- Electron beam and thermal resistance evaporation source coating can be in the central position according to customer requirements or live separately on both sides of the cavity.
- Can accurately monitor the coating speed and thickness.
- Customized machine design, which can be designed according to customer requirements
- High market share.
- High vacuum pumping speed, increasing machine productivity.
- Plasma cleaning process or ion cleaning process can be done according to customer needs.
- Process and industry:
- Au-Sn alloy evaporation process / metal electrodes with different thicknesses switch coating
- LED electrode metal-alloy coating / electronic component assembly coating
- Research machines for academic and research circles
- Product Gallery:
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