Plasma Clean System


  • It has the characteristics of high efficiency, high quality and low operating cost.
  • Using radio frequency (RF) power supply, it is easy to control and easy to operate.
  • It has an automatic pressure control system (APC system) to accurately control the process pressure.
  • It can have multiple plasma sources (ICP/RIE/PE) at the same time.
  • LED/semiconductor/industry/passive components/optical components.
  • Surface cleaning/Removal of residual photoresist (DESCUM)/Film removal/Wire/(Die) Bonding pretreatment.