ALD (atomic layer) system
- LOAD-LOCK CST IN/OUT operator model.
- Heat and plasma chemical vapor deposition can obtain ultra-thin films with high uniformity.
- 100% shape retention, precise thickness control, and excellent uniformity specifications.
- PE MODEL is suitable for low process temperature
- Metal ALD process / Oxide ALD process / Nitride ALD process
- LENS AR optical coating / MINI LED / MICRO LED and other industries.