ALD (atomic layer) system

  • LOAD-LOCK CST IN/OUT operator model.
  • Heat and plasma chemical vapor deposition can obtain ultra-thin films with high uniformity.
  • 100% shape retention, precise thickness control, and excellent uniformity specifications.
  • PE MODEL is suitable for low process temperature
  •  Metal ALD process / Oxide ALD process / Nitride ALD process
  • LENS AR optical coating / MINI LED / MICRO LED and other industries.