Double electron beam evaporation system
- The machine is suitable for academic, research and industrial.
- The substrate size is 2~8 inch wafer.
- The evaporate rate and alloy ratio of the two electron beam evaporation sources can be adjusted.
- Dual monitoring terminals can accurately monitor the rate and thickness.
- Customized machine design, which can be designed according to customer requirements.
- High market share.
- High vacuum pumping speed, increasing machine productivity.
- Plasma cleaning process or ion cleaning process can be done according to customer needs.