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Electron beam evaporation system

  • Feature of product:
  • The machine is suitable for academic, research and industrial use.
  • The substrate size is 2~8 inch wafer.
  • High production capacity in the industry.
  • Substrate water cooling mechanism, which can be used in low temperature substrate manufacturing process.
  • Customized machine design, which can be designed according to customer requirements.
  • High market share.
  • High vacuum pumping speed, increasing machine productivity.
  • Plasma cleaning process or ion cleaning process can be done according to customer needs.
  • Process and industry:
  • Metal evaporation process / oxide evaporation process / Au/Sn and other alloy evaporation process.
  • LED electrode/ITO oxide/MOSFET electrode.
  • Third-generation semiconductor electrode coating/academic and research industry research machine
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