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Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
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Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
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Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Company Profile
About
Management team
Business philosophy
Equipment advantages
History
News & Events
Product Information
Vacuum system
Vacuum evaporation system
Vacuum sputter system
Cluster optical evaporation system
Plasma clean system
ADL deposition system
Factory Affairs System and Engineering
Factory System and Engineering
Customer Service
Repair and maintenance
Consumables for sale
Equipment upgrade
Fu Cheng Optoelectronic
About FU CHENG OPTOELECTRONIC
Business item
Sales service network
Maintenance training base
Contact us
Contact
Inter Back sputter system
Category :
Vacuum sputter system
,
Vacuum system
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Batch sputter system
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Feature of product:
The plasma cleaning process is combined .
Shorten the trolley spacing and increase the utilization efficiency of target coating.
The substrate can be fully coated and has the advantages of low PARTICLE process.
It can cooperate with the auto-handing pick-and-place film and CIM plant planning.
The operating platform is established to facilitate equipment maintenance.
Customized coating effective area and specification structure to meet industrial process requirements.
Process and industry:
Metal sputter process / reactive sputter process / oxide sputter process
Touch sensor / Optical / active and passive component / Chip EMI and other industries.
Product Gallery:
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Related:
Optical Cluster Sputter System
ALD (atomic layer) system
Plasma ion source evaporation system
Vacuum Sputter System of Load-Lock Type