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ALD (atomic layer) system

批次ALD(原子層)鍍膜設備

  • Feature of product:
  • LOAD-LOCK CST IN/OUT operator model.
  • Heat and plasma chemical vapor deposition can obtain ultra-thin films with high uniformity.
  • 100% shape retention, precise thickness control, and excellent uniformity specifications.
  • PE MODEL is suitable for low process temperature
  • Process and industry:
  •  Metal ALD process / Oxide ALD process / Nitride ALD process
  • LENS AR optical coating / MINI LED / MICRO LED and other industries.
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